Method for growing an epitaxial layer of material using a high temperature initial growth phase and a low temperature bulk growth phase

ABSTRACT

A method for forming a trench transistor structure begins by forming a buried layers (12 and 16) and a doped well (22) in a substrate (10) via epitaxial growth processing. A trench region (24) is then etched into the substrate (10) to expose a the layer (12). A conductive sidewall spacer (28) is formed within the trench (24) as a gate electrode. The spacer (28) gates a first transistor (12, 28, 32) located adjacent a first half of the trench (24) and a second transistor (12, 28, 34) located adjacent a second half of the trench (24). Region (12) is a common electrode wherein the channel regions of both the first and second transistor are coupled in a serial manner through the region (12).

This patent application is a division of U.S. patent application Ser. No. 08/535,397 filed Sep. 28, 1995 now U.S. Pat. No. 5,705,409, which is hereby incorporated herein by reference, and priority thereto for common subject matter is hereby claimed.

FIELD OF THE INVENTION

The present invention relates generally to integrated circuit processing, and more particularly, to forming trench transistors and inverters.

BACKGROUND OF THE INVENTION

Semiconductor transistors formed on an integrated circuit are continuing to decrease is size. However, planar transistors which comprise a first current electrode laterally adjacent a channel region and a second current electrode laterally adjacent the channel region wherein the channel region separates the first and second current electrodes consume a significant amount of substrate space per transistor. Therefore, a significant amount of area that is consumed on an integrated circuit substrate is due to the planar or horizontal formation of transistors.

Today's integrated circuits are formed having millions of transistors and memory cells are formed such that millions of memory cells can be placed on a single integrated circuit. However, using planar transistors, the number of transistors that can be placed on a single integrated circuit is limited. It is now possible to form vertical transistors which generally take up less surface area than a planar transistor. However, vertical transistors are more difficult to form and may be difficult to contact/interconnect into the form of logic devices or memory cells in a small and acceptable area. Therefore, the need exists for new vertically formed trench transistors which have a smaller substrate footprint, are more manufacturable, and allow for the formation of more dense integrated circuits and memory cells.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1-9 illustrate, in cross-sectional diagrams, a method for forming both a vertical P-channel transistor and a vertical N-channel transistor from a single trench in accordance with the present invention;

FIG. 10 illustrates, in a top perspective view, a top view of the device cross-sectioned in FIG. 9;

FIG. 11 illustrates, in a cross-sectional diagram, an alternate embodiment to FIG. 9 which is in accordance with the present invention;

FIGS. 12-17 illustrate, in both cross-sectional diagrams and top perspective views, a process for forming a three transistor structure for use in making a random access memory cell in accordance with the present invention;

FIGS. 18-20 illustrate, in cross-sectional diagrams, a method for forming a contact for a vertical structure or a random access memory cell in accordance with the present invention;

FIGS. 21-22 illustrate, in cross-sectional diagrams, another process for forming a contact for a vertical structure or a random access memory cell in accordance with the present invention;

FIGS. 23-34 illustrate, in both cross-sectional diagrams and top perspective views, a process for forming a six transistor (6 T) random access memory (RAM) in accordance with the present invention;

FIG. 35 illustrates, in a circuit diagram, the cross connections and transistors illustrated in FIGS. 32 and 34 in accordance with the present invention;

FIG. 36 illustrates, in an X-Y plot, a method for growing an epitaxial layer of material to form a buried layer in accordance with the present invention;

FIG. 37 illustrates, in a top perspective view, three possible contact configurations of a contact illustrated in FIG. 32 in accordance with the present invention;

FIGS. 38-42 illustrate, in a top perspective view, a layout of an SRAM cell using two of the one-half SRAM structures of FIG. 32 in accordance with the present invention;

FIG. 43 illustrates, in a cross sectional diagram, an alternative embodiment to the structure of FIG. 32 wherein a load resistor replaces a P-channel RAM pull-up transistor; and

FIGS. 44-50 illustrate, in a top perspective view, another layout of an SRAM cell using two of the one-half SRAM structures of FIG. 32 in accordance with the present invention.

It will be appreciated that for simplicity and clarity of illustration, elements illustrated in the FIGURES have not necessarily been drawn to scale. For example, the dimensions of some of the elements are exaggerated relative to other elements for clarity. Further, where considered appropriate, reference numerals have been repeated among the FIGURES to indicate corresponding or analogous elements.

DESCRIPTION OF A PREFERRED EMBODIMENT

FIG. 1 illustrates a P-type silicon substrate 10. Other potential substrate materials include but are not limited to P-type or N-type silicon, gallium arsenide, silicon on sapphire, epitaxial formations, germanium, germanium silicon, polysilicon, silicon on insulator substrates, wafer-bonded substrates, and/or like substrate materials. A masking layer and a mask developing step (not illustrated in FIG. 1 and usually involving known photoresist processing) is used to mask an ion implantation. This ion implantation step is used to form an N-region 12 in FIG. 1 as a diffusion region. The P-type substrate is typically doped with a P-dopant, such as boron, so that the doping concentration of the substrate 10 is somewhere within a range of 10¹³ to 10¹⁵ dopant atoms per cubic centimeter. The N-region 12 is doped, preferably with antimony or arsenic to a doping concentration of roughly 10¹⁷ to 10²¹ dopant atoms per cubic centimeter. Antimony and arsenic are preferred for the formation of the N-region 12 since these atoms will defuse less than a phosphorous N dopant given the same amount of heat and same exposure time to the heat. A sacrificial implant oxide can also be formed over the substrate 10 and the region 12 either prior to formation of the region 12 or after formation of the region 12. These optional dielectric layers are not illustrated in FIG. 1.

After formation of the region 12, all dielectric layers or masking layers are removed from overlying the substrate 10 resulting in the device illustrated in FIG. 1. Typically, any dielectric such as air, wet or dry thermal oxide, silicon nitride, nitrided oxide, fluorinated oxide, oxynitride, polyoxide, a chemical vapor deposition (CVD) film, a plasma enhanced chemical vapor deposition (PECVD) film, a low pressure chemical vapor deposition (LPCVD) film, a high temperature oxide (HTO) film, a tetraethylorthosilicate (TEOS) based oxide, a polyimide film, a borophosphosilicate glass (BPSG) film, a phosphosilicate glass (PSG) film, germanium oxide, or like dielectric materials may be used for dielectric layers as taught herein.

In FIG. 2, the surface of the substrate and the surface of the doped region 12 are optionally cleaned via an RCA clean or a like process and exposed to an epitaxial process environment. The epitaxial process will grow an epitaxial layer of silicon 14 on top of the region 12 and the substrate 10. Subsequent to FIG. 2, the substrate 10 will be referred to as both region 10 of FIG. 1 and region 14 of FIG. 2 since both the regions 10 and 14 are of a similar or identical substrate material. In many cases, it would be difficult to distinguish region 14 from region 10 or find the boundary therebetween. A typical process used to manufacture the region 14 is a two step epi-process or, in the alternative, the novel process of FIG. 36 discussed below. The process of FIG. 36 is taught in detail later in this text while the two-step process is taught here. The two step epi-process first uses a high temperature 1150° C. low pressure (10 Torr) SiH₂ Cl₂ epitaxial substrate exposure. This first exposure is followed by a low temperature 900° C. low pressure (10 Torr) SiH4 epitaxial exposure. The thickness of epi-layer 14 is relatively thin and is typically on the order of a few hundred angstroms. By growing the region 14 the region 12 becomes an N-type buried layer 12. A dashed line is used to delineate region 14 from substrate 10 in FIG. 2 since the epitaxial region 14 is nearly indistinguishable from the substrate 10 since both region 14 and substrate 10 are single crystalline silicon material.

FIG. 3 illustrates that a P-type region is ion implanted into a masked portion of the substrate 10 (previously referred to as region 14). P-region 16 is formed in a manner similar to region 12 but is doped with boron or a like P-type dopant atom. The doping concentration of P-region 16 is typically within the range of 10¹⁷ to 10²¹ atoms per centimeter cubed. The region 16 is preferably formed having a width less than the width of region 12 as illustrated in FIG. 3. Region 12 and region 16 abut one another to form a PN junction.

FIG. 4 illustrates an optional step wherein a silicided refractory metal region 18 is implanted into the boundary between the P-region 16 and the N-region 12. Region 18 is formed to reduce any diode voltage drop occurring across the PN junction formed by regions 12 and regions 16. In an alternate form, the effects of the PN junction can be reduced by grading the dopant change over distance at the interface of region 16 and region 12. Region 18 is optional and the grading of the junctions between region 12 and region 16 is also an option that will render region 18 not needed. Therefore, the optional silicide/metal region 18 is not further illustrated in subsequent figures.

In FIG. 5, an blanket intrinsic epitaxial silicon layer 20 is formed over the P-region 16 rendering both the P-region 16 and N-region 12 buried layers. Region 12 is doped P-type in a manner similar to region 14 of FIG. 2 and is typically formed having a thickness of roughly several hundred angstroms to one micron. P-type doping of region 20 can be performed in-situ to the growth of region 20 or can be performed via P-well processing. The process used to form region 20 is similar to the process described with respect to FIG. 2 or can be any intrinsic epi-process. Since the region 20 is epitaxial silicon, region 20 should be relatively indistinguishable from the substrate 10 and from the region 14 in FIG. 2. Therefore, as in FIG. 2, region 20 will hereafter be referred to as part of the substrate 10.

In FIG. 6 a deep phosphorous implant and a drive-in/anneal step are used to form a well region 22 having an N-type doping concentration. Phosphorous is used for the N-well region to allow for driving and proper situation of the N-well without substantially or adversely driving the doped regions 12 and 16. The N-well 22 may also be formed by trench etch, polysilicon plug, and recrystallization techniques which are known in the bipolar industry. Typically, the doping of the N-well region 22 is at least an order of magnitude higher than the doping concentration of the P-region 20 in FIG. 5 Therefore, if the P-region 20 is doped to 10¹⁵ boron atoms per centimeter cubed, the N-well 22 is doped to around 10¹⁶ phosphorous atoms per centimeter cubed. In order to form N-well 22, it may be advantageous to perform several phosphorous implants at different energy levels.

FIG. 7 illustrates that a trench region 24 is formed through a portion of the N-well 22 and a portion of the P-region 16 to expose a portion of the N-region 12. The slopes of trench region 24 are slightly tapered when etched using a typical process and the bottom corners of the trench region 24 are typically curved/rounded and less pointed. In order to etch region 24, a masking layer (not illustrated in FIG. 7) is formed overlying the well region 22 and the substrate 10 wherein the etch chemistry used to etch region 24 should not substantially etch the masking layer. Initially, before forming the depth of the trench 24, native oxide is removed off the surface of the exposed region of well 22 and the substrate 10. A typical chemistry that can be used to etch the trench region 24 are chlorine based chemistries such as BCl₃ /Cl₂, H₂ /Cl₂ /SiCl₄, and CHCO₃ /O₂ /N₂. In addition, reactive ion etch (RIE) etch processing is typically used. In other embodiments, a fluorinated chemistry such CF₄ or SF₆ may be used and in addition, a polymer depositing etchant species may also be added to the etch mixture to protect sidewalls of the trench region 24. One sidewall protecting species is known to be CHF₃. Trench region 24 can be formed using a timed non-selective etch or can be formed using a timed non-selective etch until region 22 is cleared and then reverting to an etch that is selective and stops/slows when exposed to N-type materials such as N-region 12.

FIG. 8 illustrates that a gate dielectric region 26 is formed within the trench 24 and overlying a top surface of a substrate 10 and the N-well 22. Dielectric layer 26 may be formed by dielectric growth processing (a thermal layer) or dielectric layer 26 can be a composite dielectric layer comprising grown oxide and chemical vapor deposited (CVD) oxide. In addition, the gate oxide 26 may be exposed to nitrogen, fluorine, and/or chlorine to further increase the effectiveness and robustness of the oxide 26. After formation of the oxide or dielectric layer 26, a conductive sidewall spacer 28 is formed laterally adjacent a sidewall of the trench 24. Spacer 28 is typically formed of a polysilicon or amorphous silicon material, but may be any conductive material capable of spacer formation. The material used to form spacer 28 can either be insitu doped during deposition or be ion implanted after deposition but before spacer etching to be one of either N-type or P-type. In another form, half of the spacer 28 which is annular in shape and surrounds a sidewall of the trench 24 can be formed being P-type while another half of the spacer 28 can be formed being N-type even though dopants in polysilicon diffuse much faster than in single crystalline silicon. The sidewall spacer can also be selectively silicided or salicided. A masking region is used to form a tab region off of spacer 28 so that spacer 28 is later top-down contacted by a via or contact opening. The tab region 28a of spacer 28 is illustrated in FIG. 10, wherein FIG. 10 is a top down illustration of the final device cross-section FIG. 9.

In FIG. 9, a dielectric plug region 30 is formed around an inner-circumference of the annular spacer 28 of FIG. 8. The plug region 30 is preferably formed via deposition and etch back or chemical mechanical polishing (CMP) processing. An optional etch stop layer may be formed above the substrate 10 and around the trench region 30 by forming the etch/polish stop region before the formation of the trench. Once plug region 30 is formed, a first mask and implant operation is used to form a P-region 32 and a second mask and implant operation is used to form an N-region 34 as illustrated. Therefore, FIG. 9 illustrates two transistors, one transistor being P-channel and another transistor being N-channel, which are serially coupled together via the connection of regions 12 and 16 and gated by a single gate electrode 28. A first transistor which is N-channel has a current electrode 12 and a second current electrode 34 wherein a channel region separates the region 12 and region 34 at a left sidewall of the trench 24 in FIG. 9. A second transistor which is a P-channel transistor is formed to the right of FIG. 9 and has current electrodes 16 and 32 wherein a channel region is illustrated between regions 16 and 32 adjacent a right-most portion of the trench region 24. Therefore, the current flow of both the N-channel and P-channel transistor illustrated in FIG. 9 is vertical to a top surface of the substrate 10. Because region 16 is coupled to region 12, the N-channel and P-channel transistors of FIG. 9 are connected in series. It is important to note that field oxide isolation, trench isolation, or a like method of isolation is not illustrated in FIG. 9 for simplicity. However, dielectric isolation will be present in a manufactured device laterally adjacent the P-region 32, the trench region 24, and the N-region 34.

FIG. 10 illustrates a top perspective view of FIG. 9 wherein FIG. 9 is FIG. 10 cross-sectioned along the line 9. FIG. 10 illustrates the N-region 34 and the P-region 32 which are surrounded by field isolation. The trench region 24 is filled in FIG. 10 via the gate dielectric 26, the gate electrode spacer 28, and the plug region 30 wherein the trench region is also surrounded by isolation dielectric. The tab region 28a discussed in reference to FIG. 8 is illustrated in FIG. 10 and preferably overlies the isolation laterally adjacent the trench. In another form, contact may be made to the spacer directly over the region 30. However, the tab region 28a makes contact to the spacer gate electrode 28 easier to manufacture.

FIG. 11 illustrates that the P-region 16 and the N-region 12 formed in FIGS. 1-5 may be formed side by side with one another as illustrated in FIG. 11. In this form, the interface dopant grading or the silicided/refractory metal region 18 discussed earlier may also be used between the interface of region 12 and region 16 in FIG. 11. Therefore, the side-by-side PN configuration of FIG. 11 as opposed to the stacked configuration of FIG. 3 results in two possible embodiments of the N-channel/P-channel method taught via FIGS. 1-10.

FIGS. 12-17 illustrate another embodiment which is used to form several transistors in a small substrate footprint. FIG. 12 illustrates a substrate 35 wherein a trench region 37 is etched within the substrate 35. The trench region 37 is formed in a manner similar to the trench region 24 of FIG. 7. After formation of the trench region 37, a dielectric layer 38 is formed along the sidewalls of the trench 37, the bottom of the trench 37, and a top portion of the substrate 35. FIG. 12 illustrates field oxide isolation regions 36. It is important to note that field oxide isolation as illustrated in FIG. 12 may be replaced by trench isolation or any other known isolation structure. A conductive layer is deposited and then reactive ion etched to form a spacer region 40a and 40b. Spacer region 40a and 40b are cylindrically coupled to each other around the circumference of the trench region 37. A height of the spacer portion 40a is higher than a height of the spacer portion 40b. This difference in height is created by masking region 40a while exposing region 40b to an etchant environment. In many cases, etch technology can be used to entirely remove region 40b from within the trench (i.e., the height of the region 40b will be zero in this case). In some circumstances, the etch technology used to etch away at region 40b is not sufficient to entirely remove all of the spacer material. In this case, a stringer, which is another name used for the reduced-height spacer 40b, is remaining in the trench 37 after the etch step is complete. This stringer does not cause any significant adverse effects to the subsequent processing of the integrated circuit (IC) as long as the spacer 40b is reduced significantly in height as illustrated in FIG. 12.

A dielectric layer 48 is formed over the spacers 40a and 40b. After formation of the dielectric layer 48 or before formation of the dielectric 48 a self-aligned ion implantation step is used to form doped regions 42, 44, and 46 which are self-aligned to the spacer region 40a and 40b. Doped regions 42, 44, and 46 are N-type as illustrated in FIG. 13, but may be created as P-type in another embodiment.

FIG. 14 illustrates a top perspective view of the structure of FIG. 13. FIG. 13 is FIG. 14 cross-sectioned along the line 13. FIG. 14 illustrates the field oxide layers 36, the doped region 42, 44, and 46, spacer 40a which is coupled to stringer or spacer portion 40b, and the gate dielectric layer 38. FIG. 14 illustrates that a masking layer is used when etching the spacer portion 40a to leave behind a region 40c adjacent to the doped region 42 and overlying the field oxide 36 wherein the tab region 40c is connected to the spacer region 40a. Tab region 40c is used since 40c can be more easily contacted by a top down connection than the spacer 40a.

After formation of the dielectric layer 48, a second conductive spacer 50a is formed adjacent the spacer 40a. The spacer 50a completely surrounds an interior portion of the trench 37. After formation of the spacer 50a, a dielectric layer 54 is formed overlying the spacer 50a. FIG. 15 therefore illustrates two transistors. A first transistor has a channel region between the doped region 46 and the doped region 42 wherein this channel region is gated by spacer portion 40a. A gate voltage may be placed on the spacer 40a via a contact to region 40c illustrated in FIG. 14. The second spacer 50a gates a channel region located between region 46 and region 44. Due to the fact that both transistors in FIG. 15 share a common electrode 46, both the transistors are connected in a serial manner.

FIG. 16 illustrates the cross-section of FIG. 15 in a top down manner. FIG. 15 is FIG. 16 cross-sectioned along line 15. FIG. 16 illustrates the doped regions 42, 44, and 46, the dielectric layer 48, spacer 50a, spacer 40a, gate dielectric layer 38, and field oxide regions 36. In addition, FIG. 16 illustrates a tab region 50b which is coupled to the spacer 50a in a manner similar to the connection of region 40c to spacer 40a. Region 50b is used to provide an easily accessible conductive area through which spacer 50a can be electrically contacted.

FIG. 17 illustrates that a masking and etch step is used to etch through dielectric layer 52, dielectric layer 48, and dielectric 38 in order to expose a portion of the doped region 46 which lies at the bottom of the trench 37. Once the opening which exposes the doped region 46 is formed, one of two methods can be performed to form the middle P-channel transistor illustrated in FIG. 17. A first method is to epitaxially grow P-region 54 from the doped region 46. After formation of region 54, an N-region 56 is expitaxial grown from the region 54. After growing N-type region 56, a P-region 58 may either be epitaxially grown or ion implanted into region 56.

In another form, an ion implant step can be used to form a P-region within the doped region 46. In this case, the P-region 54 will not overly region 46 but will be located within region 46 unlike that illustrated in FIG. 17. After this P-implant step to form a region 54 within the region 46, a polysilicon plug may be deposited and polished back to form region 56 having an N-type conductivity. An ion implant step may then be used to form the P-region 58 as illustrated in FIG. 17. This polysilicon region which comprises region 56 and 58 may be recrystallized to a certain extent or may be left as polysilicon since the P-channel transistor in FIG. 17 is likely to be used as a pull-up P-channel transistor for an SRAM cell. These pull-up transistors can typically have a larger resistance and off-current than other transistors while allowing the memory cell to function properly.

After forming the P-channel transistor in a central location of FIG. 17, the dielectric layer 60 is deposited over the P-channel transistor. An opening is etched through the layer 60 to expose a top portion of the P-region 58. A conductive layer 62 which is either polysilicon or metal, is then deposited into the opening formed through dielectric layer 60. Therefore, FIG. 17 illustrates a three transistor structure having two N-channel transistors as discussed with respect to FIG. 15 and 16 and another P-channel transistor formed within the trench 37. This P-channel transistor is gated via the spacer 50a. The structure illustrated in FIG. 17 can be used to form very compact six-transistor SRAM cells. Contact to region 46 of FIG. 17 can be performed using a contact structure illustrated in FIG. 32 via opening Y or a contact illustrated in FIGS. 18-20. In another form, region 46 can be a buried layer extending out of the page of FIG. 17 and can be contacted to by a deep-collector-type contact used in bipolar design.

FIGS. 18-20 illustrate a method for contacting a buried layer formed deep within substrate material. FIG. 18 illustrates that an N-type buried layer 64 is formed via methods discussed in FIGS. 1-6. On top of N-region 64 is formed a P-buried layer 66. On top of P-buried layer 66 is formed either a deep N-well 68 or another N-buried layer 68. On top of the N-layer 68 is formed a P-layer 69. It is important to note that the conductivities of the regions illustrated in FIG. 8 may be inverted so that instead of illustrating an N-P-N-P vertical structure, FIG. 18 can illustrate a P-N-P-N vertical structure. In FIG. 18, the region 64 operates as a first current electrode for a transistor, region 68 operates as a channel region for the transistor, and region 66 functions as a second current electrode of the transistor. In one form, the combination of electrode 66 and 64 are a storage node for a memory device. The silicide and graded junction techniques discussed with respect to FIG. 4 can be applied to region 64 and 66. In another form, as illustrated in FIG. 11, the regions 66 and 64 may be formed side-by-side with one another instead of on top of one another as illustrated in FIG. 9.

In FIG. 19, a dielectric layer 70 is deposited or grown over the P-region 69. An opening is then masked and etched through the oxide 70, the P-region 69, the N-region 68, and the P-region 66 to expose a portion of the N-region 64. This etch was performed in a manner similar to the etch performed in FIG. 7 herein. After the opening 74 has been etched in FIG. 19, a deposition and etch process is used to form dielectric spacers 72.

FIG. 20 illustrates that a conductive layer is deposited and patterned to form a conductive contact region 76 which connects to the N-region 64 while being isolated from the region 66, 68 and 69 by the spacer 72. Therefore, the process of FIGS. 18-20 illustrate a method for forming a contact to a buried layer that is embedded below several other doped buried layers wherein the buried layers are used to form vertical transistors for a memory cell, a transistor, or a like semiconductor structure/device.

FIG. 21-22 are similar in scope to FIGS. 18-20. FIGS. 21-22 illustrate that the contact of FIG. 20 may also be formed through vertically formed epiltaxial transistors as well as buried trench transistor regions. FIG. 21 illustrates a typical epitaxial vertical transistor having a substrate 80 wherein a diffused doped region is formed within the substrate. On top of the substrate 80 are formed an oxide layer 84, a polysilicon layer 86 and an oxide layer 88. An opening is etched through the oxide layers 88 and 84 and the polysilicon layer 86 to expose a portion of the doped region 82. A gate oxide layer is then grown or deposited on the sidewall of the polysilicon layer 86 which was formed by the opening. The opening is then filled by an epitaxial process that forms a drain or source region 90, a channel 92, and a drain or source region 94 as illustrated in FIG. 1.

FIG. 22 then illustrates that a contact can be formed through the regions 90, 92, and 94 to contact to the doped region 82. This contact is formed by etching an opening through the regions 90, 92, and 94. This opening must be less in diameter than a diameter of a top surface of the source 94 to avoid destroying the functionality of the transistor (i.e., etching away the entire channel region or an entire source or drain). This smaller opening is formed by depositing an oxide layer 98, patterning an opening in this oxide layer, and then etching or extending the opening through the regions 90 through 94. After forming the opening which exposes the doped area 82, a dielectric spacer 100 is formed as illustrated in FIG. 22. After formation of the dielectric spacer 100, the conductive layer 102 is deposited to form electrically contact to the region 82 while the layer 102 is being adequately isolated from the regions 90, 92, and 94. In addition, by forming the opening through the regions 90, 92, and 94, the channel region 92 of the transistor of FIG. 21 is further reduced in horizontal thickness, thereby allowing the channel region 92 to more fully deplete or more fully invert.

FIGS. 23-34 illustrate a method for forming a random access memory (RAM) cell or a fast static random access memory (FSRAM) using the vertical transistors taught herein.

FIG. 23 illustrates that a buried region 101 and a buried region 103 are formed within a substrate. Buried regions 101 and 103 are formed in a manner similar to that illustrated in FIGS. 1-6. In addition, above the buried regions 101 and 103, a deep well region 104 is formed analogous to well regions 22 in FIG. 6. The buried regions and well regions illustrated in FIG. 23 are formed before field oxide or trench isolation are formed on the substrate. Furthermore, the buried layer configuration of FIG. 11 may be used in FIG. 23.

FIG. 24 illustrates field oxide isolation regions 111. Field oxide isolation regions may be replaced with trench isolation or any known dielectric isolation scheme. FIG. 24 illustrates that two physically separated trench regions 106 and 108 are formed to expose a portion of the buried region 101. The trenches formed in FIG. 24 are analogous to the trenches formed in FIG. 7. Once the trench regions 106 and 108 are formed, a gate dielectric layer 113 is deposited within the trenches and laterally adjacent the top surface of the trenches as illustrated in FIG. 24.

FIG. 25 illustrates a top perspective view of the partial SRAM cell illustrated in FIG. 24. In order to form a complete SRAM cell, four trenches are formed in the substrate, as illustrated in FIG. 25 (FIG. 24 illustrates one half of the trenches used to form the SRAM cell). FIG. 24 is FIG. 25 cross-sectioned along the line 24 illustrated in FIG. 25. FIG. 4 illustrates half the trenches needed for one cell and the other half of the random access memory cell which is formed by trenches 110 and 112 which, when cross-sectioned, are nearly identical to the cross-sections illustrated via FIGS. 23-24. Since a c ross-section of the trench regions 110 and 112 will be similar to a cross-section of the trench regions 106 and 108, only trench regions 106 and 108 are cross-sectioned in figures subsequent to FIG. 25. FIG. 25 illustrates that the four trench regions 106, 108, 110, and 112 are physically separated from one another. In FIG. 25, trench regions 106 and 108 will be used to form three transistors of the six transistor SRAM cell whereas trench 110 and 112 will form the other three transistors of the six transistor SRAM cell.

FIG. 26 illustrates that a conformal conductive layer is deposited over the gate dielectric layer 113. The conformal conductive layer is then RIE etched to form a spacer 114. In addition to the formation spacer 114, the etch of the conformal conductive layer will form a second spacer 116 within the trench region 108. A second mask and etch process is then used to reduce a portion of the spacer 116 in height to form a reduced height spacer 116' as illustrated in FIG. 26. Spacer 114 of FIG. 26 is an annular spacer that surrounds an entire sidewall of the trench region 106. Spacer 116 is also annular in shape and surrounds an outer periphery of the trench region 108. The spacer region 116' is formed as a reduced height spacer so that the spacer 116 can form an inversion region to the right of the trench region 108 while not forming a complete inversion region to the left of trench region 108. Therefore, the spacer 116 which is coupled to the spacer portion 116' can gate a first sidewall portion of the trench region 108 while not gating al second portion of the trench sidewall of trench region 108. In some cases, etch steps can be used that completely removes the spacer portion 116' to that no spacer portion 116' is left within the trench 108.

FIG. 27 illustrates a top perspective view of FIG. 26. FIG. 26 is FIG. 27 cross-sectioned along the line 26. FIG. 20 illustrates that the conformal conductive layer which is used to form the spacer 114 is masked so that when the spacer 114 is formed, the spacer is inherently coupled to a tab portion 114". Therefore, the conductive layer used to form spacer 114 is the same conductive layer used to form the tab portion 114". Tab portion 114" provides a contact region which can be easily contacted from above to provide electrical stimulus to the spacer 114. In another form, tab portion 114" may be formed by a deposition step independent of the formation of the spacer 114. FIG. 27 also illustrates that a tab portion 116" is formed in contact with the spacer 116. FIG. 27 illustrates the spacer 116 but does not illustrate the spacer 116'. Spacer 116' is not illustrated in FIG. 27 to show that, in certain embodiments, etched chemistries can be used which will allow for complete removal of the spacer 116'. Spacer 116' is generally referred to a stringer, and stringers can either remain on an integrated circuit or be removed from an integrated circuit depending upon the aggressiveness of the particular etch processing that is used.

FIG. 28 illustrates that a dielectric layer is deposited and either chemically mechanically polished (CMP) or resist etched back (REB) to form plug regions 118 and 120. Plug region 118 is formed within the trench region 106 and plug region 120 is formed within the trench region 108. Known etch/polish stop material can be deposited overlying or underlying layer 113 in order to provide for more selective chemical mechanical polishing or resist etch back processing. A dielectric layer 122 is formed overlying the dielectric layer 113 and the plug regions 120 and 118. Either before the formation of the dielectric layer 122 or after the formation of the dielectric layer 122, a masking and an ion implantation procedure is used to form N-type regions 126 and 128 within the substrate as illustrated in FIG. 28. A second ion implantation step is used to form a P-type region 124 overlying the well region 104 as illustrated in FIG. 28. In FIG. 28, the well region 104 is N-type, the buried region 103 is P-type, and the buried region 101 is N-type. Furthermore, graded junction techniques and silicide processing can be used as illustrated in FIG. 4 to ensure that a voltage drop between regions 103 and 101 in FIG. 28 are eliminated or reduced.

FIG. 29 illustrates a top perspective view of the cross-section of FIG. 28. FIG. 29 illustrates the ion implantation regions 126 and 128 as well as ion implant region 124. A region similar to region 128 is formed as region 130 laterally adjacent to trench region 112 in FIG. 29. In the final bit cell, region 126 and analogous region 126' of FIG. 29 will be coupled to a ground supply voltage. Region 122 will be coupled to a power supply voltage which is typically a voltage between two volts and five volts. Region 116" and the analogous region adjacent trench 112 will be word lines of the SRAM cell. Region 128 will be a first bit line for the SRAM cell and region 130 will be a second bit line for the SRAM cell wherein the first and second bit line will carry logically complementary signals.

FIG. 30 illustrates that an opening is etched through the dielectric layer 122 and the dielectric layer 113 to expose a top portion of P-type region 124. A dielectric sidewall spacer 132 is formed within the opening made through the dielectric layers 122 and 113. After formation of the opening and the spacer 132, a conductive layer is deposited and patterned to form a conductive interconnect 134 as illustrated in FIG. 30. Conductive interconnect 134 makes electrical contact to the P-type region 124. The width/diameter of the opening in layer 122 after formation of the spacer 132 is a dimension X. The value X would be roughly 1.0 to 0.4 microns using current technology.

FIG. 31 illustrates a top perspective view of FIG. 30. FIG. 31 illustrates the conductive interconnect region 134 and its analogous counterpart 134' which is illustrated as overlying the trench region 110. Region 134 is used to contact a Vdd power supply voltage to the P-type region 124 illustrated in FIG. 30.

FIG. 32 illustrates that a dielectric layer 136 is deposited over the conductive interconnect region 134. A masking and etching process is then used to etch an opening through the dielectric layer 136, the conductive interconnect 134, the region 124, the region 104, and the buried region 103, to expose a portion of the buried region 101. The opening has a diameter/width Y wherein Y is less than dimension X of FIG. 30. It is important to note that selective etching can be used such that the spacer 132 and dielectric layer 122 provide self-alignment of this opening as illustrated in FIG. 32. The opening Y illustrated in FIG. 34 should be less than the opening X formed in FIG. 30 so that the conductive interconnect layer 134 is not electrically disconnected from its contact to region 124 as illustrated in FIG. 32. After formation of the opening Y which exposes a portion of the buried region 101, dielectric spacers 138 are formed to isolate a sidewall of the interconnect layer 134, and the regions 124, 104, and 103. After formation of the spacer 138, an optional ion implantation step is performed to form an N region 136 within the substrate. N region 136 is ion implanted to ensure that electrical contact is made to buried layer 101 via the opening illustrated in FIG. 32. A conductive layer 140 is then deposited and patterned to form electrical contact to either the region 136 or the region 101.

FIG. 33 illustrates, in a top perspective view, the cross-section of FIG. 32. FIG. 33 clearly illustrates the conductive layer 140 as formed in FIG. 32.

Returning to FIG. 32, FIG. 32 illustrates three transistors of the six transistors used to form the six transistor SRAM cell. A first transistor is an N-channel transistor which has a gate electrode 114 wherein the gate electrode 114 gates a channel region located between a first current electrode 126 and a second current electrode 101. The transistor formed by regions 114, 101, and 126 is referred to as a latch transistor 500 of an SRAM cell as illustrated in FIG. 35 via latch transistor 500. A second transistor has a gate electrode 114 which gates a channel region through region 104. This second transistor has current electrodes which are formed by regions 124 and 103. This second transistor is a P-type transistor and is referred to as a P-type pull up transistor 502 in FIG. 35. A third transistor, which is an N-channel word line transistor or select transistor 504 in FIG. 35, is illustrated in FIG. 32 as having a gate electrode 116, a first current electrode 128, and a second current electrode 101. The gate electrode 116 gates a channel region located between the current electrode 128 and the current electrode 101. The gate 116 has been reduced in height around a certain portion of the trench region 108 to form a reduced spacer 116' as illustrated in FIG. 32. In a preferred form, the spacer portion 116' can be completely removed. This reducing of the height to form a spacer portion 116' is performed so that spacer 116 does not gate a channel region between region 124 and region 103 to the left of plug region 120.

Therefore, three transistors are illustrated in FIG. 32 and identified in the circuit diagram of FIG. 35 wherein the cross-section of FIG. 32 illustrates three transistors of the six transistors illustrated in FIG. 35. The other three transistors of the SRAM cell are formed via trench regions 110 and 112 and are similar in physical attributes to the three transistors illustrated in FIG. 32. These transistors within trenches 110 and 112 are illustrated in FIG. 35 as being transistors 506-510.

FIG. 34 illustrates a top perspective view of FIG. 32 including metal layer interconnections which are required to complete the interconnections of the SRAM cell. FIG. 34 illustrates conductive layers 142-154. These conductive layers illustrated in FIG. 34 are also illustrated in FIG. 35 so that the top level metal connections of FIG. 34 can be compared to the circuit diagram of FIG. 35. FIG. 34 illustrates that a first bit line is formed by contacting a conductive member 144 to region 130 in FIG. 34. FIG. 34 illustrates that a second bit line is formed via conductive layer 142 which is contacted to region 128. FIG. 34 illustrates that a wordline is formed via the conductive layer 146. The circularly coupled inverters that form the memory element of the SRAMs cell are formed via interconnnects 148 and 150. The ground signal is provided to the SRAM cell via a conductive layer 154 which couples to regions 126 and 126'. A Vdd power supply signal is provided to the region 134 and region 134' to provide power to both sides of the SRAM cell.

FIG. 35 illustrates, in a circuit diagram, the SRAM cell as illustrated in FIG. 32 and FIG. 34.

FIG. 36 illustrates a low temperature (Low T) ramp activated epitaxial growth (LT-TRAG) process for forming epi on a highly clean surface due to HCl presence. This process is performed with low DT (diffusion coefficient *time/temperature) which is highly advantageous for forming close together insitu doped epi regions with sharp (non-graded) junctions. In region A of FIG. 36, the wafers are inserted into an epi chamber at a low temperature (typically within range of 200-600° C.) to avoid wafer dishing. The temperature is then ramped in a step/region B where optionally there are no growth or etchant gases present in the epi process chamber.

In a step C, dichlorosilane (SiH₂ Cl₂ --an epi growth gas) is pumped into the chamber along with HCl. The HCl input is optional since secondary and primary reactions of SiH₂ Cl₂ in the epi chamber form HCl as a byproduct, and this byproduct may be enough for the etching purposes described below. Far to the left of the region C (but within region C) is a time period wherein the HCl etch rate is greater than a Si epi growth rate due to the SiH₂ Cl₂. As temperature is ramped within step C, the etch rate via HCl is eventually overcome by an increasing growth rate due to the presence of SiH₂ Cl₂. Therefore, the substrate is in a slight etching state in the left portion of region C and the substrate is being slightly etched/cleaned just before and right up until the time epi growth begins in a middle portion of region C. Therefore, the substrate is very clean when epi growth starts and growth continues to progress as time continues to the right hand side of the region C. Also, the HCl in the chamber will remove initial metallic contaminants from the epi and substrate surface up until growth begins and during growth in step C.

In step D, the SiH₂ Cl₂ is reduced in concentration since SiH2Cl2 only breaks down and grows Si at a high temperature (>850° C. roughly). The SiH2Cl2 is replaced by a growth species such as Si2H6 or SiH4 which breaks down and grows Si at a low temperature of roughly 400-800° C. Therefore, in step E the bulk of the epi growth is performed at low DT due to the lower temperature in region E. In a step F, growth is complete and the wafers are ramped down to removal temperature. Once a low enough temperature is reached, the wafers are removed from the chamber with the epitaxial growth region now in place.

The above process may be used to form superior epi layers to result in the buried regions of FIGS. 1-6.

In summary, steps A-C ensure that a Cl or HCl environment creates and maintains a clean substrate up until the moment of growth. This is key to avoid point defects, bulk defects (3-D defects), faceting (in some cases), high deviation in growth rate over wafer, epi dislocations, stacking faults in Si, etc. in the epi growth. The steps E) through F ensure that once the clean surface begins growth, a lower temperature growth gas is switched into the chamber to reduce total DT thereby allowing thin or thick epi regions with little vertical and lateral diffusion of arsenic, phosphorus, boron, antimony, and like dopants. Bulk growth at 900° C. results in diffusion of dopants even though it may be slight (tens of angstroms or so). Even though the diffusion is slight, many epi layers are now hundreds of angstroms thick and even a 10 Angstrom deviation is a 1-10% shift in a junction position thereby affecting vertical transistor channel regions, Miller capacitance, buried region positioning, and the like. Therefore, by doing bulk growth (FIG. 36--region E) at a lower temp (at best <600° C. or worse case <800° C.), one can form more abrupt PN junctions, better control junction profile, and epitaxial doped thicknesses. By being able to produce abrupt injunctions, one can accurately control the profile of the junctions by changing insitu doping concentrations over time and not relying solely on dopant diffusion to grade junctions. Therefor, the ability to form an abrupt junction does not mean that one must do so since LDD regions and reduction in E fields requires graded junctions in some cases. In this case, the process can be used to custom design the junction in a controlled graded manner.

In summary, the process of FIG. 36 produced a ramp-activated epitaxial growth region which ensures a clean substrate up until the growth begins thereby reducing defects. This method also has a total low DT so that junctions and diffusion of dopants can be further controlled for ultra thin epi layers and junction profile control.

FIG. 37 illustrates that, in FIG. 37, when the opening Y is less than the opening X, any reasonable degree of misalignment will still produce a functional device and not disconnect layer 134 from region 124. In other words, the contact of Vdd to the SRAM is not compromised by misalignment as long as Y<X. See also FIG. 41.

FIGS. 38-42 illustrates one way in which the device of FIG. 32 can be used to form a complete SRAM cell layout. FIG. 38 illustrates that the buried layer 101 illustrated in FIG. 32 is formed twice wherein these two buried regions 101 are separated from one another as illustrated.

FIG. 39 illustrates the ground diffusion 126 of FIG. 32, the four trench regions 106, 108, 110, and 112 (see FIG. 25), and the P-type Vdd diffusion region 124 of FIG. 32. FIG. 39 also illustrates the bit line diffusion 128 and the complementary bit line diffusion 130. FIG. 40 illustrates that a polysilicon layer is deposited and etched to form the word line 116 having a spacer portion 116' as illustrated in FIG. 32. The spacer portion 116' is assumed to be totally removed and not illustrated in FIG. 40.

FIG. 41 illustrates a position of the Vdd conductive interconnect 134 illustrated in FIG. 32. This Vdd layer 134 is contacted through the opening having the dimension X as illustrated in FIG. 30 and FIG. 41. On top of the Vdd interconnect 134 is the cross couple connections 140 illustrated in FIG. 32 (connections 148 and 150 in FIG. 34). The dimension Y of FIG. 32 is illustrated in FIG. 41.

In FIG. 42, the bit line 142 and the complementary bit line 144 are illustrated as coupling to the underlying diffusions 128 and 130 of FIG. 39. In FIG. 42, a ground line 154 having two connections per cell is illustrated. The two ground (GND) line contacts may slightly expose or intersect the cross-coupling 140 thereby requiring that the two contacts for GND be internally insulated around their circumference by a dielectric sidewall spacer before layer 154 is formed to avoid electrical short circuiting between the cross-coupling 140 and the ground line 154. `L`-shaped layout of the layers 140 may also aid in reducing the need for a dielectric spacer.

FIG. 43 illustrates that the P-channel transistor comprising current electrodes 103 and 124, channel region 104, and gate electrode 114 in FIG. 32 may be placed with a resistor load 200 coupled between the storage node 101 and the Vdd interconnect 134. If this resistor load is used, then the need to drive down the spacer 116 to form a stringer or non-existent spacer portion 116' may also be needed for the spacer 114. However, one may choose not to drive down the spacers and in this case (as illustrated in FIG. 43) the voltages on the gates 116 and 114 may affect the conductivity of the resistor and change its resistance. This change can be controlled by thicker oxide regions, counter-doping for a high threshold, and/or a larger horizontal separation between the contact dimension X and the sidewall of the spacers.

FIGS. 44-50 illustrate another layout that can be used for the device of FIG. 32 to form a random access memory (RAM) cell. In FIG. 44, the two N buried layers 101 are formed.

In FIG. 45, the trenches 106, 108, 110, and 112 are formed and a Vdd diffusion 124 is formed. Bit line diffusions 130 and 128 are formed along with a ground (GND) diffusion 126. It is important to note that the polysilicon interconnects and the diffusion regions in the layouts taught herein could be silicided or salicided for improved conductivity.

In FIG. 46, the word line 116 is formed and inverter gate inputs 114 are formed as illustrated in cross-section FIG. 32.

In FIG. 47, one cross-couple 140 is formed to form one-half of the circular inverter for the SRAM cell.

In FIG. 48, the other cross-couple 140 is formed to form the other half of the circular inverter for the SRAM cell. In FIG. 48, the two cross couples 140 are not symmetric and while achieving a smaller surface area that the layout of FIG. 42, the non-symmetry of the cross-couples 140 is a trade-off that must be considered.

In FIG. 49, the ground (GND) diffusion is coupled to a conductive line 154 and the Vdd diffusion is coupled to a conductive line 134.

In FIG. 50, the bit line 142 and the complementary bit line 144 are formed and contacted to the bit line diffusions 128 and 130 of FIG. 45. It is important to note that the contacts illustrated in FIGS. 47-50 may "clip" underlying conductive regions and interconnects thereby requiring dielectric spacers to avoid unwanted electrical short-circuiting. This "clipping" can be avoided in the alternative by making the cell slightly larger to give the contacts more room for misalignment.

While the present invention has been illustrated and described with reference to specific embodiments, further modifications and improvements will occur to those skilled in the art. For example, plurality is intended to mean any value between 2 and infinity and should not be limited to any one constant or sub-range within 2 to infinity. Binary information or binary bit as taught herein is any system containing at least two values and includes ternary and quaternary logic systems (logic 0, logic 1, tri-state). The P-channel transistors taught herein can be polysilicon or like resistors to form ST SRAM cells. Tilt rotational ion implants can be used to dope vertical channel regions. It is to be understood, therefore, that this invention is not limited to the particular forms illustrated and that it is intended in the appended claims to cover all modifications that do not depart from the spirit and scope of this invention. 

What is claimed is:
 1. A method for growing a layer of material, the method comprising the steps of:providing a substrate having an exposed surface; placing the substrate into a chamber at a low temperature; removing oxygen from the chamber; exposing the substrate simultaneously to a first growth gas and an etching gas wherein: (1) a growth rate of the exposed surface due to the first growth gas is less than an etch rate of the exposed surface due to the etching gas when the chamber is set at the low temperature, whereby material is etched from the exposed surface when the chamber is at the low temperature; and (2) a growth rate of the exposed surface due to the first growth gas is greater than an etch rate of the exposed surface due to the etching gas when at a high temperature greater than the low temperature so that material is grown on the exposed surface when the chamber is set to the high temperature; ramping the temperature of the chamber from the low temperature to the high temperature over a first period of time while both the etchant gas and the first growth gas are present within the chamber whereby the etch rate is reduced relative to the growth rate during the ramp so that the etch rate becomes less than the growth rate; removing the first growth gas from the chamber and replacing the first growth gas with a second growth gas capable of providing epitaxial growth at a temperature lower than the high temperature; and reducing the temperature from the high temperature to the temperature lower than the high temperature to allow epitaxial growth to continue at the temperature lower than the high temperature to complete formation of the layer of material.
 2. The method of claim 1 further comprising:forming a doped region within the substrate and close to the exposed surface of the substrate; and growing the layer of material on top of the doped region to form the doped region as a buried doped region located below the layer of material.
 3. A method for growing a layer of material, the method comprising the steps of:(a) placing a semiconductor wafer into a chamber at a first temperature; (b) ramping a temperature of the chamber to a second temperature which is greater than the first temperature; (c) flowing a first growth gas into the chamber at or above the second temperature, the first growth gas resulting in a growth species and an etch species being present in the chamber whereby wafer cleaning from the etch species and material growth due to the first growth species are occurring simultaneously on the wafer which is located in the chamber; (d) reducing the temperature of the chamber and replacing, at least partially, the first growth gas with a second growth gas which allows for continued material growth on the wafer at a lower temperature than a temperature obtained in step (c); and (e) reducing the temperature and removing the wafer from the chamber after material growth is complete.
 4. The method of claim 3 wherein one or more of the steps (a) and (b) comprise:removing oxygen from the chamber to reduce native oxide formation on the wafer.
 5. The method of claim 3 wherein the step (c) comprises:flowing SiH₂ Cl₂ as the first growth gas.
 6. The method of claim 3 wherein the step (c) comprises:providing HCl as the etch species.
 7. The method of claim 3 wherein the step (d) comprises:providing Si₂ H₆ as the second growth gas.
 8. The method of claim 3 wherein the step (d) comprises:providing SiH₄ as the second growth gas.
 9. The method of claim 3 wherein the step (c) comprises:obtaining a chamber temperature of at least 800° C. for a period of time.
 10. The method of claim 3 wherein the step (d) comprises:maintaining a chamber temperature of less 800° C. for all time during step (d).
 11. The method of claim 3 wherein the step (d) comprises:maintaining a chamber temperature of less 600° C. for all time during step (d).
 12. The method of claim 3 further comprising:forming a doped region within a substrate and close to the exposed surface of the substrate; and using steps (a) through (e) to form the doped region as a buried doped region.
 13. The method of claim 3 further comprising:forming a first doped region within a substrate and close to the exposed surface of the substrate; using steps (a) through (e) to form epitaxial material over the first doped region to make the first doped region a first buried doped region; forming a second doped region over the first doped region; using steps (a) through (e) to form epitaxial material over the second doped region to make the second doped region a second buried doped region overlying the first buried doped region.
 14. The method of claim 13 further comprising:forming a second buried doped region with an opposite conductivity type of the second buried doped region.
 15. The method of claim 13 further comprising:using the steps (a) through (e) to form a portion of an SRAM cell.
 16. The method of claim 13 wherein the step (c) further comprises:raising the temperature over time within step (c) wherein: (1) initial stages of step (c) etch wafer material at an etch rate which is greater than a growth rate of new material; and (2) later states of step (c) etch wafer material at an etch rate which is less than a growth rate of new material.
 17. A method for growing a layer of material, the method comprising the steps of:providing a substrate; doping a portion of the substrate to form a doped region near a surface of the substrate; growing a first portion of the layer of material on the substrate at a temperature greater than 800° C. using a growth gas, the growth gas generating both an etch species which cleans the substrate and a growth species which grows a portion of the layer of material onto the substrate; changing the growth gas to another growth gas wherein the another growth gas allows for a remainder of the layer of material to be grown at a temperature which is less than 600° C.; and wherein formation of the layer of material makes the doped region a buried region.
 18. The method of claim 17 wherein the step of forming the doped region comprises:forming the doped region as a composite doped region wherein a top portion of the doped region is a first conductivity type and a second portion of the doped region is a second conductivity type different from the first conductivity type.
 19. The method of claim 17 wherein the buried region is a source/drain electrode in an SRAM cell.
 20. The method of claim 17 wherein the step of changing the growth gas comprises growing a portion of the remainder of the layer of material at a temperature of roughly equal to 400° C.
 21. A method for growing a layer of material, the method comprising the steps of:(a) placing a semiconductor wafer into a chamber at a first temperature; (b) ramping a temperature of the chamber to a second temperature which is greater than the first temperature; (c) flowing a first growth gas into the chamber at or above the second temperature, the first growth gas resulting in a growth species and an etch species being present in the chamber whereby wafer cleaning from the etch species and material growth due to the first growth species are occurring simultaneously on the wafer which is located in the chamber; (d) reducing the temperature of the chamber and replacing, at least partially, the first growth gas with a second growth gas which allows for continued material growth on the wafer at a lower temperature than a temperature obtained in step (c), wherein this step (d) maintains a chamber temperature of less 600° C. for a substantial period of time while the second growth gas is provided into the chamber; and (e) reducing the temperature and removing the wafer from the chamber after material growth is complete wherein the material growth is used to form a plurality of separate buried layers within the semiconductor wafer. 